Introduction
As the limits of detection (LODs) for trace metal analysis are increasingly being pushed to the next decimal, a need exists to meet these new detection requirements without compromising accuracy or precision. Inductively coupled plasma mass spectrometry (ICP-MS) is often the technique of choice for routine applications requiring ultra-trace detection limits.
For a number of elements, spectroscopic interferences can have a significant impact on the ability to achieve low detection limits by traditional ICP-MS systems. In this study, we take a look at multi-quadrupole ICP-MS technology, with a focus on the mechanisms of removing spectral and other interferences to secure the LODs, accuracy, and precision needed for challenging applications.
Read this article to learn more about multi-quadrupole ICP-MS technology and its benefits.
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